Accuracy analysis and development of laser direct patterning system

Ki-Taek Lee, Marquette University

Abstract

The most important task in laser direct patterning is to achieve a high quality pattern on a glass substrate as defined by its dimension and shape accuracy. The objective of this research is to improve the laser direct patterning method to increase the accuracy of the pattern used for large flat panel displays. The mathematical model for volumetric error of the machining center and the needed optical system will be presented in this study. The translational and the rotational errors of the machining center have been measured and analyzed to get the errors on the substrate. The errors on the substrate have been successfully compensated by considering the optical characteristic of lens. The error compensation algorithm has been also verified experimentally.

Recommended Citation

Ki-Taek Lee, "Accuracy analysis and development of laser direct patterning system" (January 1, 2007). Dissertations (1962 - 2010) Access via Proquest Digital Dissertations. Paper AAI3263813.
http://epublications.marquette.edu/dissertations/AAI3263813

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