Document Type

Article

Language

eng

Publication Date

2-8-2006

Publisher

IOP Publishing

Source Publication

Journal of Micromechanics and Microengineering

Source ISSN

0960-1317

Abstract

This study presents a basic step toward the selection methodology of electric contact materials for microelectromechanical systems (MEMS) metal contact switches. This involves the interrelationship between two important parameters, resistivity and hardness, since they provide the guidelines and assessment of contact resistance, wear, deformation and adhesion characteristics of MEMS switches. For this purpose, thin film alloys of three noble metals, platinum (Pt), rhodium (Rh) and ruthenium (Ru) with gold (Au), were investigated. The interrelationship between resistivity and hardness was established for three levels of alloying of these metals with gold. Thin films of gold (Au), platinum (Pt), ruthenium (Rh) and rhodium (Ru) were also characterized to obtain their baseline data for comparison. All films were deposited on silicon substrates. When Ru, Rh and Pt are alloyed with Au, their hardness generally decreases but resistivity increases. This decrease or increase was, in general, dependent upon the amount of alloying.

Comments

Accepted version. Journal of Micromechanics and Microengineering, Vol. 16, No. 3 (February 8, 2006): 557. DOI. © 2006 IOP Publishing. Used with permission.

Ronald A. Coutu was affiliated with the Sensors Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, OH at the time of publication.

Download
coutu_12297acc.docx (378 kB)
ADA accessible version

Share

COinS