Effects of Hydrogen Pretreatment on Physical-Vapor-Deposited Nickel Catalyst for Multi-walled Carbon Nanotube Growth

Authors

Benjamin L. Crossley, Air Force Institute of TechnologyFollow
Mauricio Kossler, Air Force Institute of Technology
Ronald A. Coutu Jr., Marquette UniversityFollow
Lavern A. Starman, Air Force Institute of TechnologyFollow
Peter J. Collins, Air Force Institute of TechnologyFollow

Document Type

Article

Language

eng

Publication Date

2-1-2010

Publisher

Society of Photo-Optical Instrumentation Engineers (SPIE)

Source Publication

Journal of Nanophotonics

Source ISSN

1934-2608

Abstract

Physical vapor deposited nickel catalyst layers of 10, 50, 100, 200, 350, and 500 angstroms were granulated using hydrogen plasma for varying times to determine an effective carbon nanotube (CNT) growth process using microwave plasma enhanced CVD (MPECVD). Nickel was deposited via sputtering or evaporation. The catalyst granule size, density, and resulting CNTs were analyzed. Sputtered nickel of 50 angstroms with 5 minutes of hydrogen plasma pretreatment resulted in the most effective CNT growth.

Comments

Published version. Journal of Nanophotonics Vol. 4, No. 1 (February 1, 2010): 049502. DOI. © 2010 SPIE. Used with permission.

Ronald A. Coutu, Jr. was affiliated with Air Force Institute of Technology, Wright-Patterson AFB, OH at the time of publication.

Recommended Citation

Crossley, Benjamin L.; Kossler, Mauricio; Coutu, Ronald A. Jr.; Starman, Lavern A.; and Collins, Peter J., "Effects of Hydrogen Pretreatment on Physical-Vapor-Deposited Nickel Catalyst for Multi-walled Carbon Nanotube Growth" (2010). Electrical and Computer Engineering Faculty Research and Publications. 347.
https://epublications.marquette.edu/electric_fac/347