Document Type

Conference Proceeding

Language

eng

Publication Date

3-7-2014

Publisher

Society of Photo-Optical Instrumentation Engineers (SPIE)

Source Publication

Proceedings of SPIE 8973, Micromachining and Microfabrication Process Technology XIX,

Abstract

A method for fabricating structures half the size of the listed minimum feature size of a direct-write laser lithography system was demonstrated by taking advantage of the offset spacing allowed between write paths of the machine. This unique process allows microelectromechanical systems (MEMS) structures to be fabricated with minimum features smaller than equipment specifications. This method provides an increase in the capability of a lab without having to go through the cost and effort of re-tooling in order to provide the same capabilities. This ability will allow for the design and fabrication of structures, such as sensors, with an increased degree of sensitivity over those previously designed and fabricated with the same equipment. This new process resulted in 500 nanometer wide beams which half the size of the minimum feature size specified for our equipment.

Comments

Published version. Published as a part of the Proceedings of SPIE 8973, Micromachining and Microfabrication Process Technology XIX, (7 March 2014): 89730B. DOI. © (2014) Society of Photo-Optical Instrumentation Engineers (SPIE). Used with permission.

Ronald A. Coutu was affiliated with Air Force Institute of Technology at the time of publication.

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